Scroll Top

UV OZONE CLEANER

System Overview

The compact Samco UV-1 Ozone Cleaner utilizes a unique combination of ultraviolet light, ozone and controlled heating to etch organic materials.

 

Technical Specifications

  • Substrate Size – upto 150mm (6 inch)
  • Maximum Sample Thickness – 5mm (17mm, between stage and UV lamp)
  • UV light Source – Hot cathode, low-pressure mercury vaper lamp (primary wavelengths:254 nm and 185 nm)
  • Ozone generator – Silent discharge type; at least 5g/m3 at 0.5 liter/min oxygen flow rate
  • UV-lamp and Ozone generator switches – can be switched ON or OFF during the process
  • Substrate heater – Ambient to 300°C
  • Digital Timer –  0 to 99 min:59 sec
  • Ozone killer – Common metal honeycomb type ozone scrubber removes residual ozone in the process gas exhaust stream. Concentration of ozone at the exhaust is less than 0.1PPM
  • Dimensions – 450mm(W)x400mm(D)x411mm(H)

 
Applications

  • Removing organic contamination
  • Pre-cleaning wafers prior to deposition
  • Descumming photoresist and polyimide
  • Cleaning prior to wafer bonding
  • Surface modification for better adhesion
  • UV curing
  • Growth of thin stable oxide films (GE, GaAs, Si)

 

Location: E6-01-09, Class 100 Cleanroom

Contact: e6nanofab@nus.edu.sg