UV OZONE CLEANER
System Overview
The compact Samco UV-1 Ozone Cleaner utilizes a unique combination of ultraviolet light, ozone and controlled heating to etch organic materials.
Technical Specifications
- Substrate Size – upto 150mm (6 inch)
- Maximum Sample Thickness – 5mm (17mm, between stage and UV lamp)
- UV light Source – Hot cathode, low-pressure mercury vaper lamp (primary wavelengths:254 nm and 185 nm)
- Ozone generator – Silent discharge type; at least 5g/m3 at 0.5 liter/min oxygen flow rate
- UV-lamp and Ozone generator switches – can be switched ON or OFF during the process
- Substrate heater – Ambient to 300°C
- Digital Timer – 0 to 99 min:59 sec
- Ozone killer – Common metal honeycomb type ozone scrubber removes residual ozone in the process gas exhaust stream. Concentration of ozone at the exhaust is less than 0.1PPM
- Dimensions – 450mm(W)x400mm(D)x411mm(H)
Applications
- Removing organic contamination
- Pre-cleaning wafers prior to deposition
- Descumming photoresist and polyimide
- Cleaning prior to wafer bonding
- Surface modification for better adhesion
- UV curing
- Growth of thin stable oxide films (GE, GaAs, Si)
Location: E6-01-09, Class 100 Cleanroom
Contact: e6nanofab@nus.edu.sg