Scroll Top

PLASMA CLEANER - VITA

System Overview

Femto Science VITA 8 plasma cleaner can be used for material etching and activation as well as 2D material surface treatment.


Technical specifications

  • Wafer size: up to 200mm or 8 inch
  • Gas Flows: Ar, O2
  • RF power: 13.56MHz / 20-300W adjustable
  • Manual and Automatic Operation Mode
  • Uniformity within wafer: 2% – 5%


Location: 
Level 1 Cleanroom Class 100

Contact: e6nanofab@nus.edu.sg