System Overview

The MicroWriter ML3 Pro is a sub-micron lithography machine.

Technical Specifications

• Maximum substrate size: 9”x 9”
• Maximum write area: 8”x 8”
• Minimum substrate size: 1cm x 1cm
• Substrate thickness: 0 – 10 mm
• Motion stage minimum XY step size: 4nm
• Maximum resolution: 0.6µm
• Surface tracking autofocus, automatic lens changer for exposure resolution and alignment microscope
• Optical surface profiler Z resolution: 100nm
• Exposure wavelength: 365nm and 405nm
• Maximum writing speed: 50 mm2/minute at 1 µm & 15 mm2/minute at 0.6 µm
• Overlay alignment accuracy at best resolution: ± 0.5µm
• Mask design software: Clewin supplied

Location: E6-01-03, Class 10 Cleanroom

Contact: e6nanofab@nus.edu.sg