System Overview

DWL 66fs is a high resolution pattern generator for direct writing and mask making.

Available Resource

AZ 1512, AZ1518

Technical Specifications

• Direct patterning for maximum substrate size: 9” x 9”
• Minimum substrate size: 10 x 10 mm²
• Maximum write area: 200 x 200 mm²
• Substrate thickness: 0 to 6 mm
• Illumination source: Diode Laser (405 nm) for standard positive resist exposure
• Direct writing with minimum feature size of 0.6 μm
• High accuracy overlay alignment of 400 nm
• Vector Exposure Mode offers five different line widths
• Complex topographies patterning capability for micro-optical
• Components or any other gray scale application
• Interferometer stage position resolution: 10 nm

Location: E6-01-03, Class 10 Cleanroom

Contact: e6nanofab@nus.edu.sg