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LASER WRITER (CLASS 10)

System Overview

DWL 66fs is a high resolution pattern generator for direct writing and mask making.


Available Resource

AZ 1512, AZ1518


Technical Specifications

  • Direct patterning for maximum substrate size: 9” x 9”
  • Minimum substrate size: 10 x 10 mm²
  • Maximum write area: 200 x 200 mm²
  • Substrate thickness: 0 to 6 mm
  • Illumination source: Diode Laser (405 nm) for standard positive resist exposure
  • Direct writing with minimum feature size of 0.6 μm
  • High accuracy overlay alignment of 400 nm
  • Vector Exposure Mode offers five different line widths
  • Complex topographies patterning capability for micro-optical
  • Components or any other gray scale application
  • Interferometer stage position resolution: 10 nm


Location: E6-01-03, Class 10 Cleanroom

Contact: e6nanofab@nus.edu.sg