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ELLIPSOMETER

System Overview 

An ellipsometer can be used to characterize many material properties, such as thickness, crystallinity, doping concentration, band gap, and refractive index. It measures the change in polarization of an incident light beam that interacts with and reflects off the sample and compares it to a model.

Technical Specification

  • High-resolution UV-VIS (230 nm – 900 nm) scanning spectrometer with FWHM bandwidth less than 0.5 nm.
  • High-resolution NIR extension up to 2500 nm: InGaAs detector directly adapted on the UV-Visible spectrometer, nominal wavelength range of 900 nm to 2500 nm, FWHM bandwidth less than 3 nm.
  • Automatic incidence angle range control: 12.5 to 90 degrees.
  • Independent adjustment of analyzer and polariser arms.
  • Microspot optics (theoretical spot dimensions: 365 µm × 470 µm at 75° on sample).
  • Ultra microspot option: additional slit allowing smaller spot size down to 60 µm at optical arm output (spot size on sample: 60 µm × 120 µm at 60°).
  • Automated sample stage enabling X-Y cartography of the sample. Includes special software for sample stage control, data collection, and graphic display.
  • Motorized Z allowing automatic focusing on the sample.
  • Accommodates samples up to 200 mm in diameter.

 

Location: E6-05-09, Cleanroom

Contact: e6nanofab@nus.edu.sg