System Overview

The acid wet bench is designed for acid processes (HF, HCL, HNO3, Acidic Acid, etc.)

Technical specifications

• Quartz tank for processing 1 cassette of 8 inch wafers
• Quartz tank for processing 1 cassette of 6 inch wafers
• Quick Dump Rinse (QDR)
• DI water and N2 Teflon gun
• Log in/log out system for individual user

Location: E6-01-02, Class 100 Cleanroom

Contact: e6nanofab@nus.edu.sg