Femto Science VITA 8 plasma cleaner can be used for material etching and activation as well as 2D material surface treatment.

Technical specifications

• Wafer size: up to 200mm or 8 inch
• Gas Flows: Ar, O2
• RF power: 13.56MHz / 20-300W adjustable
• Manual and Automatic Operation Mode
• Uniformity within wafer: 2% – 5%

Location: Level 1 Cleanroom Class 100

Contact: e6nanofab@nus.edu.sg