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XEF2 ETCHER

System Overview

Xenon Difluoride etcher is a kind of vapor etcher where reactive gas spontaneously reacts with a material in vapor phase.

This XeF2 can etch Si and Ge isotropically and offers excellent selectivity to various materials such as Al, SiO2, Si3N4 and photoresist.


Location: E6-05-09, Level 5 Cleanroom

Contact: e6nanofab@nus.edu.sg