Available Targets and Resources

Deposition and Growth Cluster

Tools	Available Targets and Resources
ALD @ L5 CR	Al2O3, HfO, ZrO and TiN
Sputter – AJA UHV @ L1 CR	Ti, Mo, W, SiO2, Pt, ZnO, HfO, ITO, NiOx and IGZO
Sputter – ULVAC Multi-chamber (Majest S200)	Mg, Cu, W, Fe60Co20B20, Fe90Co10, Fe80B20, Co, Pt, Ru, Ta, Ti and MgO

Etch Cluster

Tools	Available Targets and Resources
ICP Etch Cluster @ L5 CR	Metal etch (W, Al, AlN tested) InP grating etch
PECVD @ L5 CR	HfO, ZrO and TiN

Lithography Cluster

Tools

Available Targets and Resources

Laser Writer @ L1 CR	AZ1512 and AZ1518
Mask Aligner @ L1 CR	UV and DUV AZ1512 AZ4110 * Remarks: Masks are not provided.

Last update: 27 June 2021